Fourth harmonic generation apparatus

ABSTRACT

A fourth harmonic frequency generating method and apparatus is provided. The system includes within the optical cavity an active laser medium, a second harmonic generator for generating second harmonic frequency of the fundamental frequency emitted by the laser. The fundamental beam is directed to a second harmonic generation crystal where a portion of the fundamental beam is converted to a second harmonic beam. Both the second harmonic and unconverted fundamental beams are directed back across the second harmonic generator by reflective surfaces for a second pass prior to any conversion of second harmonic beam to a higher harmonic beam. Preferably the second harmonic and fundamental beams are reflected by one of the laser cavity reflective surfaces for the second pass. Optionally, there can be separate reflective surfaces to reflect each of the fundamental and second harmonic beams. A third harmonic generator for generating third harmonic frequency of the fundamental frequency, a fourth harmonic generator for generating a fourth harmonic frequency of the fundamental frequency and a wavelength selective coupling to facilitate the removal of the fourth harmonic beam from the optical cavity are provided in optical communication with the reflected second harmonic and fundamental beam. Optionally the unconverted second harmonic beam can be directed through the laser medium as additional pumping. Optionally substantially all UV beams are removed from the laser cavity. The resulting laser has improved conversion efficiency and an improved mode quality.

This application is a contiuation-in-part of Ser. No.: 09/277,394 filedon Mar. 26, 1999 now U.S. Pat. No. 6,061,370.

FIELD OF THE INVENTION

The field of the invention concerns a frequency quadrupled laser, and inparticular a method and apparatus for generating a fourth harmonic beam.

BACKGROUND OF THE INVENTION

Optical harmonic generation using a non-linear medium such as a crystal,provides a method for doubling, tripling or quadrupling of the frequencyof electromagnetic radiation emitted by a laser or other high intensitysource. Harmonic generation and optical parametric oscillation have beendemonstrated in crystals such as LiNbO, KDT, KTP, BBO, LBO and others.Blue, green and UV lasers have found industrial, medical and scientificapplications.

UV lasers are used in drilling, microwelding and the like. Intracavityfourth harmonic generation has been suggested. See Tso Yee Fan and BruceH. T. Chai, “Intracavity Fourth Harmonic Generation Using Three Piecesof LBO in a Nd:YAG Laser”, OSA Proceeding on Advanced Solid State Lasers1994 Vol. 20, pps. 377-380. However, such prior art fourth harmoniclasers are lower powered in the order of about 270 mw of fourth harmonicpower. Other fourth harmonic lasers have been proposed see U.S. Pat. No.5,206,868. There still exists a need for improved high powered fourthharmonic lasers.

SUMMARY OF THE INVENTION

According to the invention a fourth harmonic frequency generating methodand apparatus is provided. The system includes within the optical cavityan active laser medium, a second harmonic generator for generatingsecond harmonic frequency of the fundamental frequency emitted by thelaser. According to the invention, fundamental beam is directed to asecond harmonic generation crystal where a portion of the fundamentalbeam is converted to second harmonic beam. Both the second harmonic andunconverted fundamental beams are directed back across the secondharmonic generator by reflective surfaces for a second pass prior to anyconversion of second harmonic beam to a higher harmonic beam. Preferablythe second harmonic and fundamental beams are reflected by one of thelaser cavity reflective surfaces for the second pass. Optionally, therecan be separate reflective surfaces to reflect each of the fundamentaland second harmonic beams. A third harmonic generator for generatingthird harmonic frequency of the fundamental frequency, a fourth harmonicgenerator for generating a fourth harmonic frequency of the fundamentalfrequency and a wavelength selective coupling to facilitate the removalof the fourth harmonic beam from the optical cavity are provided inoptical communication with the reflected second harmonic and fundamentalbeam. Optionally the unconverted second harmonic beam can be directedthrough the laser medium as additional pumping. In another aspect of theinvention substantially all UV beams are removed from the laser cavitypreferably 99% or greater. A UV beam separator is desirably providedbetween the fourth harmonic generator and the laser medium. The UV beamseparator can be a separating mirror or a prism. Desirably, the UV beamseparator is a prism for separating unconverted fundamental beam from UVthird and fourth harmonic beam. The resulting laser has improvedconversion efficiency and an improved mode quality.

Fourth harmonic output of Nd:YAG or Nd:YLF or Nd:YVO₄ is desirable insome applications such as in small hole drilling on multilayer circuitboards. The fourth harmonic wavelength is one fourth of its fundamentalwavelength. The focus ability is proportional to the wavelength. Whatthis means is the shorter the wavelength, the smaller the spot size towhich the beam can be focused. In addition to its better focus ability,the higher photon energy of the fourth harmonic tends to have betterinteraction in certain material processing applications.

Useful in this invention are a type I and type II preferably type Iphase matching crystal for second harmonic generation and type I or typeII phase preferably type II matching crystal for third harmonicgeneration and a type I or type II preferably type I phase matchingcrystal for the fourth harmonic generation. In a type I phase matchingcrystal for a second harmonic generation, the polarization orientationof the fundamental beam is orthogonal to the one of the second harmonicbeam. In a type II phase matching crystal for third harmonic generation,the polarization orientations of fundamental beam and second harmonicbeam are orthogonal. Resulting polarization orientation of the thirdharmonic beam is parallel to the polarization orientation of one of twoinput beams (for example in a type II LBO crystal the polarization ofthe fundamental beam and the third harmonic beam will be parallel).

In a type I LBO fourth harmonic crystal, both the fundamental and thirdharmonic beam polarization orientations are parallel.

It is an object of the invention to provide efficient intracavitygeneration of optical fourth harmonic frequency of light or radiation,using several nonlinear crystals or other conversion means positionedwithin the optical cavity containing the active laser medium.

It is an object of the invention to provide laser frequency quadruplingapparatus by using LBO nonlinear crystals within the laser cavity.

It is an object of the invention to provide frequency quadruplingapparatus with a high conversion efficiency (quadrupled outputpower/total fundamental output power).

It is an object of the invention to provide high output of quadrupledfrequency beam in ultraviolet.

It is further object of the invention to remove substantially all thefourth harmonic beam from the laser cavity.

A further object of the invention is to provide a fourth harmonic beamwith improved mode quality.

A further object of the invention is to remove substantially all UVradiation from the laser cavity before it come in contact with thelasing medium.

Other and further objects will become apparent from the specifications,drawings and claims.

The preferred embodiment of the represent invention is illustrated inthe drawings an examples. However, it should be expressly, understoodthat the present invention should not be limited solely to theillustrative embodiment.

DESCRIPTION OF THE DRAWINGS

FIG. 1 is a diagrammatic view of a laser according to the invention.

FIG. 2 is a diagrammatic view of an alternative embodiment of the laseraccording to the invention.

FIG. 3 is a diagrammatic view of another alternative embodiment of thelaser according to the invention.

FIG. 4 is a diagrammatic view of further alternative embodiment of thelaser according to the invention.

FIG. 5 is a diagrammatic view of further alternative embodiment of thelaser according to the invention.

FIG. 6 is a diagrammatic view of further alternative embodiment of thelaser according to the invention.

DETAILED DESCRIPTION OF THE INVENTION

According to the invention, a frequency quadrupled laser is providedwhich includes first and second reflective surfaces preferably highlyreflective, which form an optical resonator cavity. An efficientintracavity fourth harmonic frequency generating laser is provided withan improved conversion efficiency and improved mode quality. A lasermedium preferably a solid state laser medium is located within theoptical resonator cavity to generate a fundamental beam ofelectromagnetic radiation having a preselected wavelength propagatingfrom the front and back ends of the laser medium. A second harmonic LBOcrystal(cut for either critical phase matching or non-critical phasematching) located within the optical resonator cavity is provided forconverting a portion of the fundamental beam to a second harmonic beam.A type II frequency tripling LBO nonlinear crystal(cut for criticalphase matching) is also located within the laser resonator cavity. Thefundamental frequency beam from the laser is directed through the type Ifrequency doubling crystal within the optical cavity. As a result aportion of the fundamental beam is converted to second harmonic beam.The fundamental and second harmonic beams are reflected back through thetype I crystal where the fundamental beam is again partially convertedto second harmonic beam prior to any conversion of the second harmonicbeam to higher harmonic beam. The resulting fundamental and secondharmonic beams are then directed to a type II frequency tripling LBOnonlinear crystal which converts a portion of the fundamental beam and asubstantial portion of the second harmonic beam to a third harmonicfrequency when both fundamental and second harmonic beams propagatethrough the frequency tripling crystal. The third harmonic beam and theunconverted fundamental beam are then directed across a type I fourthharmonic LBO crystal cut for critical phase matching where a portion ofthe fundamental beam and a portion of the third harmonic beam areconverted to a fourth harmonic frequency when both fundamental and thirdharmonic beams propagate through the frequency quadrupling crystal. Theresulting beams which are the fundamental, second harmonic, thirdharmonic and fourth harmonic are then directed to a fourth harmonicseparator in which the fourth harmonic beam is separated from thefundamental beam and directed outside the optical resonator cavity asthe output of the laser. The fundamental beam is then directed backthrough the laser medium for amplification. Optionally both thefundamental and the unconverted second harmonic beams can be directedback through the laser medium to increase its efficiency. A reflectivesurface is provided at the back end of the laser medium to reflect thefundamental beam back to the laser medium for further amplification.

In another aspect of the invention UV radiation is removed from thelaser cavity prior to any contact by the UV beam with the laser medium.UV beams can be very destructive to laser medium and particularly tolaser crystals. Nd:YVO₄ crystals are particularly sensitive. Thus, it isdesirable to separate UV beams from the fundamental beam prior to thereturn of the fundamental beam to the laser medium. A UV beam separatoris desirably provided between the fourth harmonic generator and thelaser medium. The UV beam separator can be a separating mirror or aseries of separating mirrors. Preferably a prism most preferably adispersion prism which efficiently separate the fundamental beam fromfourth or third harmonic beam is provided. Optionally a combination ofprisms and mirrors can be provided. The fourth harmonic separator andthe UV separator can be combined. In the laser according the inventionthe third harmonic and fourth harmonic beams are UV beams. The combinedfourth harmonic separator and UV separator can be for example a dichroicmirror which is highly reflective for both fourth harmonic and thirdharmonic beams. Optionally a prism or pair of prisms or multiple prismscan be provided to spatially separate fourth harmonic beam and thirdharmonic beam from fundamental beam as shown for example in FIG. 2.

Referring now to FIG. 1, a fourth harmonic laser is provided. A lasingmedium LM is provided within the laser resonator cavity. A number ofdifferent lasing mediums, preferably laser crystals, can be used forexample Nd:YLF, Nd:YAG, Nd:YVO₄. A laser pump LP for example a lamp,laser diodes or another laser is provided to energize the lasing medium.Mirror M1 and M4 are provided to define the optical resonator cavity.Optionally, a Q switch QS can be provided in the event a pulsed laseroutput is desired instead of a continuous wave output. Optionally,spherical lens L2 and cylindrical lens L1 are provided particularly witha Nd:YLF crystal. The cylindrical lens compensates for thermal lensingcharacteristics of the crystal particularly of a Nd:YLF crystal. In theQ switch option, the lasing is held off by introducing a loss into theresonator cavity while energy is pumped into and stored in the atomicpopulation inversion. Once desired inversion is attained, cavity lossesare reduced to allow lasing. In this mode, it is possible to producelarge pulse chain output from the laser. Mirror M1 is a high reflectormirror for the fundamental frequency of the lasing medium LM. The lasermedium is selected to generate a laser beam at a preselected fundamentalfrequency along a common axis 1. Optionally as shown in FIG. 1 theoptical axis can be unshaped. A beam propagates from both the front endof the laser medium and from the back of the laser medium towards MirrorM1. For example a Nd:YLF laser medium can be used which emits a beamhaving a wavelength of 1053 nm. According to the invention, secondharmonic beam having a wavelength of 527 nm and third harmonic beam inthe UV spectrum having a wavelength of 351 nm and a fourth harmonic beamin the UV spectrum having a wavelength of about 263 nm will be produced.

A mirror M2 which is a high reflector for the fundamental frequency ofthe laser medium LM and optionally a high reflector for the secondharmonic frequency is provided in optical communication with output fromthe front end of the lasing medium, LM. Desirably mirror M2 is a foldingmirror. A mirror MD is provided in optical communication with M2. MD isa high reflector for beams having the preselected fundamental frequencyand high transmission for fourth harmonic frequency beam. Desirably MDis a dichroic mirror. Optionally MD is also a high reflector for secondharmonic beam. Optionally, MD transmits desirably highly transmits thesecond and/or third harmonic beams outside the cavity along with thefourth harmonic beam. A type I LBO fourth harmonic crystal NLC3 isprovided in optical communication with the beam reflected by mirror MD.The beam propagating through crystal NLC3 is directed to crystal NLC2which is a type II lithium triborate crystal (LBO). Third harmonicgenerator NLC2 is in optical communication with the beam propagatingfrom NLC3. The beam propagating through NLC2 is directed to a type Inonlinear crystal NLC1 for second harmonic generation preferably a typeI LBO crystal. In NLC1 a portion of the fundamental beam is converted tothe second harmonic beam. The beams propagating from NLC1 are directedto mirror M4, which is a high reflector for both fundamental and secondharmonic beams.

In operation, the fundamental beam from the laser medium LM is reflectedby M1 and amplified by LM along the fundamental beam optical axis. Thebeam then incidents on mirror M2. M2 preferably reflects verticalpolarized fundamental beam to Mirror MD and transmits horizontalpolarized fundamental beam. As a result vertical polarized beams arefavored and horizontal polarized beams are discouraged. Thus laser LMlases at vertical polarization. Optionally M2 can reflect horizontallypolarized fundamental beam and transmit vertically polarized fundamentalbeam. The laser medium will then lase at horizontal polarization. MirrorMD directs the reflected fundamental beam from Mirror M2 to fourthharmonic generator NLC3 which does not affect the fundamental beam inthe absence of third harmonic beam. The fundamental beam passing throughNLC3 is directed to third harmonic generator NLC2 which does not affectthe fundamental beam in the absence of second harmonic beam. Thefundamental beam passing through NLC2 is directed through secondharmonic generator NLC1. The fundamental beam enters NLC1 at EMR port 10and exits through EMR port 20. A small portion of the fundamental beam(beam 1) converts to the horizontal polarized second harmonic beam (beam2) through NLC1 by meeting its phase matching condition (K(2w)=K(w)+K(w) either through adjusting the orientation of the crystal oradjusting the temperature of the crystal. Both fundamental beam 1 andsecond harmonic beam 2 propagate toward the mirror M4 and are reflectedback from M4. When the beam 1 passes through the NLC1 by entering EMRport 20 on reflection from the Mirror M4, another small portion of thefundamental beam converts to its second harmonic beam which is combinedwith the reflected second harmonic beam 2 to form a combined secondharmonic beam 2 which exits from NLC1 through EMR port 10 and isdirected to EMR port 30 in NLC2. The crystal NLC2 converts a portion offundamental beam 1 and a substantial portion of second harmonic beam 2propagating from NLC1 into the vertical polarized third harmonic beam(beam 3) under the satisfaction of phase matching condition K(3w)=(K(w)+K(2 w). The beams 1, 2, 3 exit NLC2 through EMR port 40 and aredirected to EMR port 50 in crystal NLC3. Beam 3 which is third harmonicand beam 1 which is fundamental exits NLC2 with polarizationorientations parallel one to the other and propagate across NLC3 inwhich a portion of the fundamental and a portion of the third harmonicbeams are converted to horizontal polarized fourth harmonic beam (beam4)under the satisfaction of phase matching condition K(4ω)=K(ω)+K(3_ω).The beams 1, 2, 3 and 4 then exits NLC3 through EMR port 60 and are thendirected to a beam separator MD. Separator MD removes fourth harmonicbeam, optionally third harmonic beam from the cavity, and reflects beam1, optionally beam 2 toward Mirror M2. Optionally, beams 2 and 3 that isthe second harmonic and third harmonic can be removed together with thefourth harmonic beam from the cavity. The fundamental beam 1 reflectedback from Mirror M2 is amplified by the laser Medium LM. OptionallyMirror M2 is reflective for second harmonic beam. Thus, beam 2 isreflected back from M2 and pumps LM to increase pumping efficiency incertain cases. The beam spot size on the crystal NLC1, NLC2 and NLC3 isdesirably one half or less than the diameter of the crystal. Theresulting laser has an improved efficiency compared with prior art. Themode quality is also improved compared with traditional external fourthharmonic generation by BBO crystal. The overall conversion efficiency iscalculated by dividing the fourth harmonic frequency output power bytotal fundamental frequency output power under the condition of nosecond harmonic frequency, third or fourth harmonic frequencygenerations. For example typically a prior art Nd:YLF laser producestotal 8 watts average power at the fundamental frequency at Q-switched1000 Hz repetition rate at 150 nanosecond pulse width. With traditionalexternal fourth harmonic generation method by BBO crystal, the fourthharmonic output power at 263 nm is about 1 watt with extremely distortedelliptical beam (elliptical ratio 3.5:1) with the conversion efficiencyof 12.5%. Using another prior art described by Tso Yee Fan and BruceChai et al., 0.8 Watts at 263 nm fourth harmonic beam was generated withthe conversion efficiency of 10%. With the configuration of theinvention, 2.2 Watts at 263 nm fourth harmonic beam was generated withexcellent beam quality at the conversion efficiency of 27.5%.

Referring to FIG. 2, an alternative embodiment of a laser according tothe invention in which a pair of prisms PR1 and PR2 preferably UV gradedfused silica prisms are used to separate the fourth harmonic beam fromthe fundamental beam is shown. The fundamental beam preferably lases athorizontal polarization. The fundamental beam from laser medium LM isdirected to Mirror M5 that is a high reflector for fundamental beam. Thefundamental beam is reflected to Prism PR1 and PR2, which deflect thefundamental beam, and directs it to NLC30. The fundamental beamincidents on and exits from both PR1 and PR2 prisms at or nearBrewster's angle. So the ‘P’ polarization of the fundamental beam willexperience minimum loss through PR1 and PR2. The ‘S’ polarization willexperience substantial loss as the beam passes through these prisms. Asthe result, the laser lases at horizontal polarization. The beam passesthrough NLC30, NLC20, NLC10 and is reflected by Mirror M4 as describedregarding to FIG. 1 except that polarizations of beam 10, beam 20, beam30 and beam 40 (fundamental, second, third and fourth harmonic) arehorizontal, vertical, horizontal and vertical. Optionally, apolarization rotator such as a waveplate(WP) is inserted between NLC30and fourth harmonic beam separator PR2 and PR1. The polarization rotatorrotates polarization half wave (90 degrees) at fourth harmonic at 263 nmand multi full wave at the fundamental at 1053 nm. The net effect fromthe polarization rotator is that it rotates the polarization of fourthharmonic beam from vertical polarization when it propagates from NLC30to horizontal polarization after it passes through the polarizationrotator, fundamental beam polarization will remain the same, horizontalpolarization. The fundamental, second, third and fourth harmonic beamsthen enter and exit prism PR2 at or near Brewster angle where the beamsare displaced from one to another. The fundamental and fourth harmonicbeams will experience minimum losses since both beams are horizontal or‘P’ polarized with the incident angle at or near Brewster angle. Thedisplaced beams enter and exit prism PR1 at or near Brewster angle whichincreases the displacement among the beams. The fundamental beam leavingPR1 is directed to mirror M5 and reflected back to LM for amplification.The second, third and fourth harmonic beams are directed to Mirror M6which is reflective for fourth harmonic, optionally for third harmonicand second harmonic beam preferably highly reflective and reflects thebeams outside the laser cavity. Preferably beam block B1 is provided toblock either the second harmonic or third harmonic or both beams fromthe output.

FIG. 3 is an alternative embodiment of a fourth harmonic laser accordingto the invention. In FIG. 3, a laser cavity is provided betweenreflecting surfaces preferably highly reflective mirrors M10 and M11.Laser medium desirably Nd:YAG, Nd:YLF or Nd:YVO₄ crystals are providedwithin the cavity. For the example of in FIG. 3, a Nd:YAG lasing crystalis used. An optional Q-switch QS is provided in the cavity. The lasermedium is excited by imputing energy desirably by an end pumping diodesource LP. An optical axis is provided between cavity mirrors M10 andM11. The Nd:YAG crystal lases at a fundamental frequency of 1064 nm.Beam separator desirably dichroic mirror M21 and optionally dichroicmirror M22 are provided along the optical axis. Fourth harmonicgenerator, particularly a fourth harmonic nonlinear crystal NLC30 suchas a fourth harmonic type I LBO crystal is provided within the cavityformed between mirrors M10 an M11 along the optical axis. A thirdharmonic generator, such as a third harmonic crystal NLC20 for examplean LBO type II nonlinear crystal is provided between the fourth harmonicgenerator NLC30 and mirror M10. A second harmonic generator NLC10located along the optical axis between M10 and M11 is provided betweenthe third harmonic crystal NLC20 and reflecting surface M10.

Beam separator, desirably dichroic mirror M21 is highly transmissive at1064 nm (fundamental beam) on side 16 and 18 and highly reflective at266 nm (fourth harmonic) on side 18. Optional dichroic mirror M22 ishighly transmissive at 1064 nm (fundamental beam) on side 12 and 14 andhighly reflective at 266 nm (fourth harmonic beam) on side 14.Optionally, M21 may be highly reflective for third harmonic beam (355nm) on side 18 in which instance the third harmonic and the fourthharmonic will be removed together as the output of the laser.Optionally, when the third and fourth harmonic are both removed by M21,the third and fourth harmonic can be separated outside the cavity.Mirror M21 may also be optionally highly transmissive to third harmonicbeam (355 nm) on side 18. Mirror M22 is highly transmissive forfundamental beam, 1064 nm and highly reflective for fourth harmonic beam(266 nm) on side 14 of mirror M22. Optionally mirror M22 may be highlyreflective for third harmonic beam (355 nm) on side 14 of mirror M22,particularly in cases where the user desires separate fourth and thirdharmonic output beams. In such cases, mirror M21 will be highlytransmissive for third harmonic on side 18 and M22 will be highlyreflective for third harmonic on side 14. Preferably mirror M21 and M22are located at or near the Brewster angle β and α respectively to theoptical axis, for fundamental beam.

In operation the Nd:YAG crystal lases at 1064 nm. The beam passes alongthe optical axis, and it is highly transmitted at P-polarization bymirror M22 which is preferably located at or near the Brewster angle αto the optical axis for the fundamental frequency. Optionally mirror M22can be coated on side 12 to transmit at fundamental beam (1064 nm).Mirror 21 is also preferably located at or near the Brewster angle β forthe fundamental beam to the optical axis so that fundamental beam atP-polarization is highly transmitted. As a result P polarization will befavored in the laser cavity. Thus laser fundamental beam will lase at aP-polarization, which in the configuration of FIG. 3 would also behorizontal polarization. The fundamental beam is directed to fourthharmonic generator NLC30 which has no effect on the beam. The beampasses through the fourth harmonic generator to the third harmonicgenerator NLC20 which also has no effect on the fundamental beam. Thebeam from the third harmonic generator then passes through the secondharmonic generator which converts a portion of the fundamental beam to asecond harmonic beam. The second harmonic beam and the fundamental beampropagating from the second harmonic generator are then reflected byreflective surface M10 for a second pass through the second harmonicgenerator where additional second harmonic beam is generated. The secondharmonic and fundamental beam are then directed across the thirdharmonic generator where third harmonic beam is produced. The threebeams propagating from the third harmonic generator NLC20 that is thefundamental, second harmonic and third harmonic beams are then directedto the fourth harmonic generator NLC30 where a portion of thefundamental and a portion of third harmonic beam are converted to fourthharmonic beam. The beams propagating from the fourth harmonic generatorNLC30 are then directed to the dichroic mirror M21 which reflects thefourth harmonic and optionally the third harmonic beam outside thecavity. Fundamental beam is transmitted by mirror M21 along the opticalaxis for ultimate return to the laser medium for amplification. Anyunreflected third or fourth harmonic beam that is transmitted throughM21 incidences on optional mirror M22 which is highly reflective forfourth harmonic and third harmonic beam. As a result, a substantiallyportion of the UV radiation remaining in the cavity is removed (both thethird and fourth harmonic are in the UV range). Preferably substantiallyall the UV radiation is removed (99% or greater) Removal of UV beams isdesirable as UV radiation can be destructive to the lasing crystal orcoatings such as the Nd:YAG and/or the Q-switch or coated mirrors.

FIG. 4 is an alternative embodiment of the invention. FIG. 4 is similarto FIG. 3 except the second harmonic generator has a high reflectivecoating 22 on its outlet port to function as a reflective surface. Thus,the second harmonic and fundamental beams exiting the second harmonicgenerator are reflected back across the crystal at the point of exitwhich is a reflective surface. As a result, the second cavity reflectivesurface is provided by the coated EMR port of NLC10.

FIGS. 5 and 6 are alternative embodiments of the subject invention whichinclude a UV separator and in particular UV separating prisms inaddition to a fourth harmonic separator. The laser medium LM in FIG. 5and FIG. 6, can be any laser medium sensitive to UV for example Nd:YAG,Nd:YLF or Nd:YVO₄. Desirably the embodiment of FIGS. 5 and 6 are used inconnection with Nd:YVO₄ laser medium preferably a laser crystal. It isimportant that the UV radiation be removed from the cavity prior to thefundamental beam being returned to the laser medium for amplification.In FIG. 5 a laser cavity is formed between mirrors M11 and M12. MirrorM12 is highly reflective for fundamental beam. Mirror M11 is highlyreflective for fundamental and second harmonic. Laser medium LM,preferably a Nd:YVO₄ Nd:YAG, Nd: YLF or Nd:YAP crystal is providedbetween mirrors M11 and M12. An optional q-switch QS is provided toallow q-switch operation of the device. A fourth harmonic separatordesirably an output coupler, preferably dichroic mirror M23 whichtransmits fundamental beam in both directions and reflects fourthharmonic beam propagating from the fourth harmonic generator isprovided. Such an output coupler M23 can transmit a significant amountof third and second harmonic beam depending on the coating applied tomirror M23.

As best seen in the FIG. 5, according to the invention a UV separator isprovided between the fourth harmonic beam separator M23 and the lasermedium LM. Desirably the UV separator is a mirror highly reflective forfourth and third harmonic beam or preferably a prism optionally two ormore prisms preferably a dispersion prism PR3 for displacing the variousharmonic beams from one another. Dispersion prisms separate beams ofdiffering wavelength into spatially separated beams. Useful are forexample Pellin Broca dispersion prisms which can change the direction ofa preselected wavelength beam about 90 degrees. The polarization of thebeam relative to the prism PR3 should be selected to minimize the lossof fundamental beam. Thus, it is preferred that the fundamental beam beat P polarization to the prism PR3.

Within the laser cavity, three nonlinear crystals are provided. Betweenmirror M23 and mirror M11, a fourth harmonic crystal FHG is provided.Between fourth harmonic nonlinear crystal FHG, and mirror M11, a thirdharmonic crystal THG is provided. Between to the third harmonic crystalTHG and mirror M11 a, second harmonic crystal SHG is provided. Thesecond harmonic crystal should be the crystal nearest mirror M11 and thefourth harmonic crystal should be nearest mirror M23 with the thirdharmonic crystal THG located between FHG and SHG. Desirably the second,third and fourth harmonic crystals are LBO crystals.

In operation the laser medium LM lases. The fundamental beam is directedto prism PR3 where it is directed to dichroic mirror M23, which ishighly transmissive for fundamental beam in both directions. Thefundamental beam then passes through mirror M23 where it incidents onfourth harmonic generator FHG. Since fourth harmonic generator FHG willonly affect the fundamental beam in the presence of third harmonic beamwhere phasing matching conditions are met, the fundamental beam passesthrough FHG unaffected. The fundamental beam is then directed to thirdharmonic generator THG which only affects fundamental beam in thepresence second harmonic beam, where phase matching conditions are met.Thus, the fundamental beam passes through THG unaffected. Thefundamental beam then passes through the second harmonic generator wherea portion of the fundamental beam is converted to second harmonic beam.The fundamental and second harmonic beam then incident on mirror M11 andare reflected back across second harmonic generator where an additionalportion of the fundamental beam is converted to second harmonic beam.The second harmonic and the fundamental beam then incidentsimultaneously on third harmonic THG where a portion of fundamental beamin the presence of second harmonic beam is converted to third harmonicbeam. The third harmonic and unconverted second harmonic and fundamentalbeam are then directed across fourth harmonic generator where a portionof the third harmonic beam and a portion of fundamental beam areconverted to fourth harmonic beam. The fundamental second, third andfourth harmonic beams are then directed to a fourth harmonic beamseparator desirably dichroic mirror M23. Mirror M23 is preferably highlyreflective for fourth harmonic and optionally for third harmonic aswell. Mirror M23 may also be highly reflective for second harmonic oroptional highly transmissive for second and/or third harmonic beams.Fourth harmonic beam is reflected by M23 outside the cavity as theoutput of the laser. Dichroic mirror M23 is highly reflective for fourthharmonic beam. However, even in a highly reflective mirror, some fourthharmonic beams will be transmitted through mirror M23. The fundamentalbeam and unreflected second and third and fourth harmonic beam aredirected to prism PR3. The fundamental beam is separated in prism PR3from substantially all the second, third and fourth harmonic beams.Prism PR3 will separate the different wavelength beams spatially. Thusthe fundamental beam will be separated from the second, third, andfourth harmonic beams. A beam blocker BB is provided for receipt ofthird and fourth harmonic beams which are UV beams. As a result,substantially all the UV beams are separated from the fundamental beam.Thus UV damage to the laser medium can be avoided.

FIG. 6 is similar to FIG. 5 except an additional prism PR4 is provided.In this embodiment mirror M23 is highly reflective for fourth, third andsecond harmonic beam. Desirably the output of the beam is separated intofourth, third and second harmonic beams by prism PR4. The second andthird harmonic beams can be directed to a beam blocker or used asadditional laser outputs.

The foregoing is considered as illustrative only to the principles ofthe invention. Further, since numerous changes and modification willoccur to those skilled in the art, it is not desired to limit theinvention to the exact construction and operation shown and describedabove, and accordingly, all suitable modifications and equivalents maybe resorted to, falling within the scope of the invention.

What is claimed is:
 1. A laser for producing a fourth harmonic beamcomprising; a) a first reflective surface and a second reflectivesurface to form an optical resonator cavity therebetween; said opticalresonator cavity having an optical axis between said first and secondreflective surfaces; b) a laser medium located within said cavity forgenerating a fundamental frequency beam of electromagnetic radiation(EMR) having a first preselected wavelength propagating from the frontend and the back end of said laser medium; c) a second harmonicgenerator for converting a portion of said EMR of said first preselectedfundamental frequency beam to a second harmonic beam in opticalcommunication with said front end of said laser medium; d) said secondharmonic generator having a first EMR port for receiving and directingradiation through said generator and a second EMR port for receiving anddirecting radiation through said generator whereby radiation will entersaid first EMR port, propagate through said generator and exit saidsecond EMR port and vise versa; e) means to direct said fundamental beamto said first EMR port; f) means to direct said fundamental beampropagating from said second ERM port to said second reflective surfaceand said second harmonic beam propagating from second EMR port to asecond harmonic reflective surface so that said fundamental and saidsecond harmonic beams are reflected to said second EMR port forpropagation back through said second harmonic generator nonlinearcrystal to produce additional second harmonic beam prior to anyconversion of second harmonic beam to a higher harmonic beam; g) meansto direct the EMR propagating from said first EMR port to a thirdharmonic generator; h) said third harmonic generator having a third EMRport for receiving and directing radiation through said generator and afourth EMR port for receiving and directing radiation through saidgenerator whereby radiation will enter said third EMR port, propagatethrough said generator and exit said fourth EMR port and vise versawhereby a portion of the fundamental and a portion of second harmonicbeam are converted to a third harmonic beam; i) means to direct the EMRpropagating from said fourth EMR port to a fourth harmonic generator; j)said fourth harmonic generator having a fifth EMR port for receiving anddirecting radiation through said crystal and a sixth EMR port forreceiving and directing radiation through said generator wherebyradiation will enter said fifth EMR port, propagate through saidgenerator and exit said sixth EMR port and vise versa whereby a portionof the fundamental and a portion of third harmonic beams are convertedto a fourth harmonic beam; k) a fourth harmonic beam separator inoptical communication with said sixth EMR port to separate said fourthharmonic beam from said fundamental beam; l) means to direct theseparated fourth harmonic beam outside said optical resonator cavity; m)directing means to direct said fundamental beam back through said lasermedium; and n) a V/C separator to separate a uv beam from saidfundamental beam prior to directing said fundamental beam back throughsaid laser medium.
 2. The laser of claim 1 wherein said laser medium isa solid state laser medium.
 3. The laser of claim 2 wherein the lasermedium is selected from the group consisting of Nd:YLF, Nd:YAG andNd:YVO₄, Nd:YAP crystals.
 4. A laser according to claim 2 wherein saidfourth harmonic beam separator includes a dichroic mirror, said dichroicmirror located along the optical axis in optical communication with saidsixth EMR port; said dichroic mirror highly transmissive to fundamentalfrequency beam and highly reflective of fourth harmonic beam to directfourth harmonic beam outside the cavity as the laser output.
 5. Thelaser of claim 4 wherein said dichroic mirror is highly reflective forthird harmonic beam to direct said third harmonic beam outside thecavity.
 6. A laser according to claim 4 wherein said UV separatorincludes a uv dichroic mirror located within said optical resonatorcavity along the said optical axis, between said fourth harmonic beamseparator and said laser medium to receive EMR transmitted by saidfourth harmonic beam separator; said uv dichroic mirror highlyreflective for fourth harmonic beam to remove additional fourth harmonicbeam from the cavity.
 7. The laser according to claim 6 wherein said UVdichroic mirror is highly reflective for third harmonic beam.
 8. A laseraccording to anyone of claims 1 or 4 wherein said UV separator includesa dispersion prism located within said optical resonator cavity alongsaid optical axis, between said fourth harmonic beam separator and saidlaser medium to receive EMR transmitted by said fourth harmonic beamseparator mirror; said prism producing a spacial displacement betweenfundamental beam, third harmonic beam and fourth harmonic beam so thatsubstantially all uv beams are separated from said fundamental beamsprior to directing said fundamental beam back across said laser medium.9. The laser of claim 8 further comprising a Q-switch to generate apulsed output.
 10. A laser according to claim 9 wherein said secondharmonic generator is a type I nonlinear crystal; said third harmonicgenerator is a type II nonlinear crystal; and said fourth harmonicgenerator is a type I nonlinear crystal.
 11. The laser according toclaim 10 wherein said second harmonic non-linear crystal is LBO.
 12. Thelaser according to claim 11 wherein said third harmonic non-linearcrystal is LBO.
 13. The laser according to claim 12 wherein said fourthharmonic non-linear crystal is LBO.
 14. The laser according to claim 4further comprising; said dichroic mirror highly reflective for fourthand third harmonic beam; a dispersion prism in optical communicationwith reflected beams from said dichloric mirror; said dispersion prismseparating third harmonic beam and fourth harmonic beam reflected bysaid dichroic mirror into separate output beams.
 15. The laser accordingto claim 1 wherein said second, third and fourth harmonic generators arenonlinear crystals.
 16. The laser according to claim 1 furthercomprising a highly reflective coating disposed on said second EMR portof said second harmonic generator to provide said second reflectivesurface and said second harmonic reflective surface so that saidfundamental and second harmonic beams are reflected back through saidsecond harmonic generator by said reflective coating.
 17. The laseraccording to claim 1 wherein said fourth harmonic beam separator andsaid UV separator are one or more dispersion prisms located within saidoptical resonator cavity along said optical axis between said fourthharmonic generator and said laser medium.
 18. The laser of claim 1wherein the fourth harmonic beam separator includes a dispersion prismfor producing a displacement among the fourth harmonic beam, thirdharmonic, second harmonic and fundamental beam.
 19. The laser of claim18 wherein said prism is located along said optical axis at about theBrewster angle for said fundamental beam so that said laser mediumproduces horizontally polarized laser beam.
 20. A method for producing afourth harmonic beam comprising; a) forming an optical resonator cavitybetween a first reflective surface and a second reflective surface; b)exciting a laser medium located within said cavity to generate afundamental frequency beam of electromagnetic radiation (EMR) having afirst preselected wavelength; c) converting a portion said fundamentalfrequency beam to a second harmonic beam by directing said fundamentalbeam across a second harmonic generator; d) reflecting said fundamentaland said second harmonic beams back across said second harmonicgenerator for a second pass across said second harmonic generator priorto any conversion of said second harmonic beam to a higher harmonic beamto convert additional fundamental beam to second harmonic beam; e)directing the fundamental and second harmonic beams propagating fromsaid second harmonic generator on said second pass to a third harmonicgenerator; whereby a portion of the fundamental and a portion of secondharmonic beam are converted to a third harmonic beam; f) directing EMRpropagating form said third harmonic generator to a fourth harmonicgenerator; whereby a portion of the fundamental and a portion of thethird harmonic beams are converted to a fourth harmonic beam; g)separating fourth harmonic beam from the fundamental propagating fromsaid fourth harmonic generator; h) directing the separated fourthharmonic beam outside said optical resonator cavity as the laser output;i) separating said fundamental beam from substantially all uv beampropagating from said fourth harmonic generator and returning saidseparated fundamental beam to the laser medium for furtheramplification.